193 nm Wavelength Conversion Laser
The 193 nm wavelength conversion laser is a high-performance narrow-linewidth deep-UV laser created by integrating a proprietary narrow-linewidth fiber laser with advanced, highly efficient frequency-conversion technology. It delivers exceptional beam quality, stable output power, and reliable long-term performance.
Its precise wavelength generation and refined linewidth control make it suitable for demanding scientific and industrial applications.
Key Features
- Deep ultraviolet (DUV) generation technology
- Advanced linewidth control
- High power stability and reliability
Application Areas
- Precision micro-machining
- Medical and biomedical applications
- Semiconductor lithography and processing
Product Information
193 nm Wavelength Conversion Laser
The 193 nm wavelength conversion laser is a high-performance narrow-linewidth deep-UV laser created by integrating a proprietary narrow-linewidth fiber laser with advanced, highly efficient frequency-conversion technology. It delivers exceptional beam quality, stable output power, and reliable long-term performance. Its precise wavelength generation and refined linewidth control make it suitable for demanding scientific and industrial applications.
Key features
Highlights- ✓Deep ultraviolet (DUV) generation technology
- ✓Advanced linewidth control
- ✓High power stability and reliability
- ✓Precision micro-machining
- ✓Medical and biomedical applications
- ✓Semiconductor lithography and processing
- ✓Deep-UV 193 nm single- or narrow-linewidth emission
- ✓High optical stability with low long-term drift
Applications
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193 nm Wavelength Conversion Laser
The 193 nm wavelength conversion laser is a high-performance narrow-linewidth deep-UV laser created by integrating a proprietary narrow-linewidth fiber laser with advanced, highly efficient frequency-conversion technology. It delivers exceptional beam quality, stable output power, and reliable long-term performance. Its precise wavelength generation and refined linewidth control make it suitable for demanding scientific and industrial applications.
Key Features
- Deep ultraviolet (DUV) generation technology
- Advanced linewidth control
- High power stability and reliability
Application Areas
- Precision micro-machining
- Medical and biomedical applications
- Semiconductor lithography and processing
Additional Attribute Highlights
- Deep-UV 193 nm single- or narrow-linewidth emission
- High optical stability with low long-term drift
- Excellent pointing and beam uniformity for sub-micron tasks
- Sealed/low-contamination optical path suitable for cleanrooms
- Temperature-stabilized conversion crystals and optimized alignment
- Configurable pulse or CW behavior depending on model
The 193 nm wavelength conversion laser is a high-performance narrow-linewidth deep-UV laser created by integrating a proprietary narrow-linewidth fiber laser with advanced, highly efficient frequency-conversion technology. It delivers exceptional beam quality, stable output power, and reliable long-term performance. Its precise wavelength generation and refined linewidth control make it suitable for demanding scientific and industrial applications.
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