193 nm Wavelength Conversion Laser
Deep-UV 193 nm system used for semiconductor lithography, micro-fabrication and advanced photochemistry.
Family #1Ready for integration
Single-frequency photonics platform
Wavelength Conversion Laser Solutions – High-Precision Performance
Reliable wavelength conversion systems (UV / Visible / IR) for spectroscopy, lithography, imaging and precision research.
RELATIVE INTENSITY NOISE< 0.05 dB
OUTPUT STABILITY< 0.6 dB
TYPICAL POWERUp to 10 W
Category overview
What Is a Wavelength Conversion Laser?
A wavelength conversion laser system outputs wavelengths different from the fundamental source by using nonlinear optical processes such as SHG, THG and frequency mixing. Techwin’s wavelength conversion family delivers narrow-linewidth, low-noise UV, visible and IR outputs for demanding scientific, industrial and biomedical applications.
Highlights
Snapshot of what this laser family delivers in the lab.
Stable frequency conversion efficiency with low drift
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Narrow linewidth outputs for high-precision measurements
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Precise wavelength tuning across UV / visible / near-IR bands
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Feature matrix
Engineered features that matter in the lab
6 engineered capabilitiesSelect to view details
193 nm Wavelength Conversion Laser – Capability #1
193 nm Wavelength Conversion Laser
Performance metrics and technical specifications across key dimensions like stability, noise, coherence and integration.
Stability
Stable deep-UV output for advanced lithography processes
All Performance Metrics
Stability
Stable deep-UV output for advanced lithography processes
Low Noise
Low noise enabling precision photochemistry applications
High Coherence
High beam quality for micro-fabrication requirements
Easy Integration
Specialized optics for UV system integration
Extreme UV
Extreme UV wavelength for semiconductor processing
Advanced thermal
Advanced thermal management for continuous UV generation
Product families
Products
Explore product families and models — quick specs, datasheets, and deep dive.
6 product familiesDatasheets & quick specs available
266 nm Wavelength Conversion Laser
High-stability 266 nm UV laser for spectroscopy, micro-marking and forensic material analysis.
Family #2Ready for integration
355 nm Wavelength Conversion Laser
Balanced UV 355 nm laser ideal for micromachining, PCB marking, medical device manufacturing and fluorescence excitation.
Family #3Ready for integration
532 nm Wavelength Conversion Laser
Stable 532 nm green laser widely used for imaging, alignment, holography and fluorescence excitation.
Family #4Ready for integration
780 nm Wavelength Conversion Laser
Near-IR 780 nm source used in atomic physics, rubidium experiments, spectroscopy and quantum optics.
Family #5Ready for integration
795 nm Wavelength Conversion Laser
795 nm IR source for D1 Rb spectroscopy, metrology, nonlinear optics and frequency reference systems.
Family #6Ready for integration
Technical advantages
Engineering advantages,explained visually.
See how this laser family behaves where it matters most – noise, linewidth, stability and system integration. Click a card to select it for comparison, or tap the info icon to see more details.
Lab-validated metrics
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Narrow-linewidth UV / visible / IR operation
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Low-noise stabilized frequency conversion
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Precision wavelength tuning and calibration
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Robust thermal design minimizing drift over long use
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High conversion efficiency with superior optical engineering
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Traceable QC: wavelength, power and stability testing reports included
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Applications
Reliable wavelength conversion systems (UV / Visible / IR) for spectroscopy, lithography, imaging and precision research.
Need UV, Visible, or IR wavelength conversion laser solutions?
Contact our application specialists to get a detailed quote, complete with datasheets and custom options, usually within one business day.